3M™ Diamond Pad Conditioner A101L, 4.25 in diam
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3M™ Diamond Pad Conditioner A101L, 4.25 in diam

3M™ Diamond Pad Conditioner A101L, 4.25 in diam

  • 3M ID7100255344
    SAP ID7100255344
    Legacy SKU80001445347
    Part NumberA101L
    Base SKUB5005035338
    Keywords3M, diamond pad conditioner, CMP pad conditioner, chemical mechanical planarization, semiconductor applications, abrasive technology, diamond retention, planarization efficiency, pad wear uniformity, corrosion resistance, customizable conditioning, 3M disks, metal contamination reduction, semiconductor industry, electronics market, longer pad life, maintenance reduction, polishing performance, wafer consistency, tungsten processes, silicon carbide processes, CMP pad usage, aggressive conditioning, pad planarity, 3M CMP pad conditioner coatings, polymer substrate, abrasive grid, CMP pad performance.
    Brand3M™
    Global Product HierarchyCMP Pad Conditioners
    Commodity2630 - Semiconductor Materials
  • Marketplace Formal Name3M™ Diamond Pad Conditioner A101L, 4.25 in diam
    Material DescriptionA101L-US
    Marketplace Description3M™ Diamond Pad Conditioner is a highly engineered chemical mechanical planarization (CMP) pad conditioner that delivers reliable performance for critical semiconductor CMP applications. It helps minimize wear and maintain consistent asperities and consistent pad performance — for wafer after wafer. CMP pad conditioners from 3M utilize sintered abrasive technology for excellent diamond retention for longer life, with controlled diamond placement and protrusion. Their single-layered diamond grid with highly controlled spacing enables you to better predict and optimize your CMP pad usage, for better planarization efficiency.
    Marketplace Description ExtendedFor metal-sensitive processes, 3M™ CMP Pad Conditioner Coatings can be factory-applied to 3M™ Diamond Pad Conditioners. These micron-thin coatings are used in advanced and mature node processes sensitive to metal, or with the harsh slurries often incorporated into tungsten or silicon carbide processes. They require minimal process changes and can help reduce metal contamination by up to 99% while maintaining flatness, aggressiveness and polishing performance.
    Bullets
    • Compatible with all 3M™ CMP Pad Conditioner Coatings with minimal process changes
    • Customizable for conditioning aggressiveness
    • Diamonds secured with both chemical and mechanical bonds for great retention
    • Exclusive polymer substrate enhances corrosion resistance
    • For metal-sensitive processes, combine with 3M™ CMP Pad Conditioner Coatings
    • Longer pad and disk life helps customers reduce the number of maintenance shutdowns, increasing their potential for lower cost of ownership
    • Optimized for extended pad and disk life
    • Tight flatness specification for 3M disks enhances pad wear uniformity and pad planarity
  • Abrasive MaterialNickel-based Alloy with Patterned Diamond
    Application
    • Advanced Node (Memory & Logic)
    • Wafer Manufacturing
    • Hard Disk Drive Manufacturing
    • CMP
  • Carrier Diameter (Imperial)4.25 in
    Carrier Diameter (Metric)107.95 mm
    Carrier MaterialStainless Steel
    CMP ProcessAll
  • Diamond Size74 μm
  • Product SeriesA101L
    Product TypePad Conditioner
  • ECCNEAR99
    Harmonized Tariff Schedule Nbr6804210030
    Sales unitEA
    SAP Shelf Life In Days0
    Target Warehouse Location Lead Time43
    SAP External Material Group31191500
  • Base (B) - Billing UnitEA
    Base (B) - Customary Cubic Dimension154.81357 IN3
    Base (B) - Customary Gross Weight1.30022 LB
    Base (B) - Customary Net Weight1.23017 LB
    Base (B) - Metric Net Weight0.5579 KG
    Base (B) - Metric Cubic Dimension2536.93 CCM
    Base (B) - Previous Packaging Level Quantity0.00
    Base (B) - Item Quantity1
    Base (B) - Total Unit Quantity0.00
    Base (B) - UnitEA
    Base (B) - Pallet Layer Quantity0.00
    Base (B) - Shipping Container Per Layer Quantity0
  • Consumer (2) - Item Quantity0
  • Inner (3) - Item Quantity0
  • Shipper (6) - Previous Packaging Level Quantity1.00
    Shipper (6) - Item Quantity0
    Shipper (6) - Total Unit Quantity1.00
  • Pallet (8) - Previous Packaging Level Quantity0.00
    Pallet (8) - Previous Packaging Level UnitLOOS
    Pallet (8) - Item Quantity0
    Pallet (8) - Total Unit Quantity0.00
    Pallet (8) - Pallet Layer Quantity0.00
    Pallet (8) - Shipping Container Per Layer Quantity0