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3M™ Trizact™ CMP Pad MR268HP, 30.5 in, Full Vision Window
3M™ Trizact™ CMP Pad MR268HP, 30.5 in, Full Vision Window
3M ID 7100306257 SAP ID 7100306257 Legacy SKU 80001600925 Part Number MR268HP Base SKU B40045199 Keywords 3M, Trizact CMP Pads, CMP pads, microreplication technology, semiconductor manufacturing, chemical mechanical planarization, advanced node CMP, pad life, low defectivity, pad performance, pad texture consistency, planarization efficiency, reduced dishing, reduced erosion, less pad debris, fewer defects, reduced metal contamination, uniform asperity control, uniform slurry flow, microreplicated asperities, microreplicated pores, consistent performance, semiconductor fabrication, electronics industry, semiconductor industry, innovative CMP material, groove design, precise asperity control, pad uniformity, longer pad life, lower cost of ownership, less downtime, pad stability. Brand Trizact™ Global Product Hierarchy CMP Pads Commodity 2630 - Semiconductor Materials Marketplace Formal Name 3M™ Trizact™ CMP Pad MR268HP, 30.5 in, Full Vision Window Material Description CMP Pad MR268HP 30.5 in FullVisionWindow Marketplace Description 3M™ Trizact™ CMP Pads use microreplication technology to help provide precise asperity control for low defectivity and consistent pad performance throughout pad life. This proprietary approach to microreplication helps to deliver a longer pad life and eliminates the need for a diamond pad conditioner, enabling you to have lower cost of ownership and less downtime. Marketplace Description Extended An innovative CMP material, 3M™ Trizact™ CMP Pads are for advanced node semiconductor manufacturing. Their precisely engineered three-dimensional microreplicated asperities and pores helps to ensure uniform asperity diameter, height and pore depth. The controlled microreplicated features helps ensure consistent performance pad-to-pad to meet the demands of semiconductor fabrication. The innovative groove design on these CMP pads help provide efficient and uniform slurry flow distribution. Bullets - Consistent texture from pad to pad
- Improved planarization efficiency to enable advanced node CMP
- Less pad debris for fewer defects
- Reduced dishing and erosion
- Reduced metal contamination risk
- Stability through pad life
- Uniformity in the chemical mechanical planarization (CMP) process
Application - Semiconductor Fabrication
- Advanced Node (Memory & Logic)
- Wafer Manufacturing
- CMP
Overall Diameter (Imperial) 30.5 in Overall Diameter (Metric) 774.7 mm Product Usage Semiconductor Wafers Sales unit EA SAP Shelf Life In Days 365 SAP External Material Group 31000000 Base (B) - Billing Unit EA Base (B) - Customary Cubic Dimension 204.80076 IN3 Base (B) - Customary Gross Weight 2.205 LB Base (B) - Customary Net Weight 2.205 LB Base (B) - Customary Height Dimension 0.2 IN Base (B) - Customary Length Dimension 32 IN Base (B) - Customary Width Dimension 32 IN Base (B) - Metric Net Weight 1.0 KG Base (B) - Metric Cubic Dimension 3356.07 CCM Base (B) - Metric Height Dimension 0.508 CM Base (B) - Metric Length Dimension 81.28 CM Base (B) - Metric Width Dimension 81.28 CM Base (B) - Previous Packaging Level Quantity 0.00 Base (B) - Item Quantity 1 Base (B) - Total Unit Quantity 0.00 Base (B) - Unit EA Base (B) - Pallet Layer Quantity 0.00 Base (B) - Shipping Container Per Layer Quantity 0 Consumer (2) - Item Quantity 0 Inner (3) - Item Quantity 0 Shipper (6) - Previous Packaging Level Quantity 1.00 Shipper (6) - Item Quantity 0 Shipper (6) - Total Unit Quantity 1.00 Pallet (8) - Previous Packaging Level Quantity 0.00 Pallet (8) - Previous Packaging Level Unit LOOS Pallet (8) - Item Quantity 0 Pallet (8) - Total Unit Quantity 0.00 Pallet (8) - Pallet Layer Quantity 0.00 Pallet (8) - Shipping Container Per Layer Quantity 0